Instrumentation and Systems for UHV, Surface Science, Vacuum Techniques, Thin Films, Material Science, Particle Nuclear Physics, Plasma Physics, Gas Flow / Blending, Cryogenics.
Latest news:
Nanotrons Offers Automated Layer-by-Layer Assembly of Nanotechnology Enabled Coatings
Bürkle supplies Coating Lines for the Production of Anti-Light Reflective Coated Solar Glass
Boulting Control Panels For Glass Coating Line
Edwards Opens New “Center for Excellence” in Hillsboro, Oregon
Calyxo GmbH reached 16.2% cell efficiency
TMC13 Deposition Rate Controller for Thin Film Applications
Universal Display Corporation and Fraunhofer IPMS – COMEDD Announce OLED Materials Agreement for ...
LED Manufacturers Considering Gallium Nitride on Silicon; Veeco Instruments MOCVD Equipment Paves the ...
Micropelt Raises 6’5 Mio EURO for Market Launch and Expansion
sp3 Diamond Technologies Ships First Hot Filament CVD Reactor to China
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Blogs
The influence of sputtering targets on the manufacturing costs and efficiency of CIGS
Obtaining Good Transmission (%T) and Reflection (%R) Measurements
Nodule Formation on Magnetron Sputtering Targets
ZnO-based thin films and light-emitting diodes grown by ALD
Replication of butterfly wings by ALD and investigation of Al2O3 passivation layer for high efficiency..
News
Nanotrons Offers Automated Layer-by-Layer Assembly of Nanotechnology Enabled Coatings
Bürkle supplies Coating Lines for the Production of Anti-Light Reflective Coated Solar Glass
Boulting Control Panels For Glass Coating Line
Edwards Opens New “Center for Excellence” in Hillsboro, Oregon
Calyxo GmbH reached 16.2% cell efficiency
TMC13 Deposition Rate Controller for Thin Film Applications
Webcasts
The Liquipel Technology Explained
Balance of power delivered to magnetrons in bipolar pulsed sputtering of aluminum oxide in high frequency..
Trends in Photovoltaics
Smart Windows and Glass Facades: Electrochromic and Thermochromic Coatings and Devices
Continuous ALD deposition on flexible substrates – towards a roll-to-roll process
The Nature of the III-V/Oxide Interface and its Impact on the ALD Growth of High-k Dielectrics for Advanced..