TECHNICAL AND DECORATIVE PVD – PECVD SYSTEMS
Thanks to advanced flexibility different technologies – CAE, MagnetronSputtering, PECVD – can be installed before purchase and in the future,according different customer needs.
- Ø 1330 x 1600 mm Chamber size
- 1100 mm usable plasma volume
- fast process
- High performance control system
- PVD and PECVD technologies