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Impel PVD System

Semicore’s Impel PVD systems utilize a cost-effective modular design that is easily configured to suit a variety of thin film deposition applications, typically for R&D or small batch production. Up to three process chambers, each uniquely configured for a specific application, share a central load lock for handling various substrate shapes and sizes up to 200mm. Integrated computer control with recipe based operation, tolerance checking and data logging is featured. A comprehensive list of standard options is available to configure the Impel PVD system to suit your specific requirements. Bulkhead or ballroom installation is available.

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Posted by: Semicore Equipment Inc 

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