Warning: Creating default object from empty value in /home/vacuumcoat/domains/vacuumcoating.info/public_html/wp-content/plugins/wp-e-commerce/wpsc-includes/purchaselogs.class.php on line 711
Hiden Ion Milling Probe – End Point Detector – Vacuum Coating .info – VCi
Latest news:
 
The leading online resource for Vacuum Coating, Plasma Processing, Thin Film Fabrication, and Nanotechnology

Instruments

 

Hiden Ion Milling Probe – End Point Detector

The only dedicated end point determination tool for ion etch control and optimum process quality. Applications Include:

- End point Analysis
- Target Impurity Determination
- Quality Control / SPC
- Residual Gas Analysis
- Leak Detection

The IMP is a differentially pumped, ruggedized secondary ion mass spectrometer for the analysis of secondary ions and neutrals from the ion mill process, featuring:

- High Sensitivity SIMS / MS with Pulse Ion Counting Detector.
- Triple filter Quadrupole, 300 amu mass range is standard.
- Differentially Pumped Manifold With Mounting Flange to Process Chamber.
- Ion Optics with Energy Analyser and integral ioniser.
- Penning Gauge and interlocks to provide over pressure protection.
- Data System with integration to the process tool.
- Stability (less than ±0.5% height variation over 24 h).
- MASsoft control via RS232, RS485 or Ethernet LAN.
- Programmable DDE, Parallel Digital I / O, RS232 Scripting Communication.

Product Image


Publisher

Posted by: Hiden Analytical Limited 
 

Log In

 
E-mail
Password
Remember Me
Or log-in using Your account on
Search