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Balance of power delivered to magnetrons in bipolar pulsed sputtering of aluminum oxide in high frequency mode and HIPIMS

posted by Stanislav Kadlec

Presented at RSD2011: International Conference on Reactive Sputtering Deposition, December 8-9, 2011 Linköping, Sweden. Bipolar pulsed reactive sputtering is a useful technique for deposition of dielectric films like Al2O3. The power balance of both magnetrons is important, as it can influence both the film thickness homogeneity of and film [...]


Trends in Photovoltaics

posted by Peter Borden

Trends in Photovoltaics by Dr. Peter Borden. 2011.


Smart Windows and Glass Facades: Electrochromic and Thermochromic Coatings and Devices

posted by Claes-Göran Granqvist

The weakest part of the building’s energy system is normally its windows and glass facades, which let in too much energy so that cooling is needed or let out too much energy so that heating is needed. The windows and glass facades are required to create indoors-outdoors contact and for [...]


Continuous ALD deposition on flexible substrates – towards a roll-to-roll process

posted by David Cameron

The application of the ALD process to continuously moving flexible substrates required for a true roll-to-roll process brings with it a number of issues. Some are similar to those in batch ALD but others are new problems due to the need to ensure the separation of precursor gas streams in [...]


The Nature of the III-V/Oxide Interface and its Impact on the ALD Growth of High-k Dielectrics for Advanced CMOS

posted by Martyn Pemble

III-V materials such as In0.53Ga0.47As are promising candidates for the scaling of n-channel MOS and MOSFET devices beyond the 22 nm node as a result of their high electron mobility. However, problems have been encountered when preparing gate oxide layers on this material resulting from the presence of native oxides [...]


High Rate Growth of SiO2 by Thermal ALD Using Tris(di-methylamino)silane and Ozone

posted by Guo Liu

High Rate Growth of SiO2 by Thermal ALD Using Tris(di-methylamino)silane and OzoneAtomic layer deposition (ALD) of SiO2 has been explored using a wide variety of precursors ranging from halides to organometalic silanes and silanols. Yet few existing ALD processes for SiO2 are satisfactory. Tris(dimethylamino)silane (TDMAS) is a promising ALD precursor [...]


Pulsed-bias Sputter Deposition of Chromia and Alumina Films at Low Substrate Temperature

posted by Martynas Audronis

This work uses a novel approach of combined medium frequency (20 – 350 kHz) asymmetric bipolar pulsed magnetron sputtering (pulsed-DC) and pulsed substrate biasing to reactively deposit Cr2O3 and Al2O3 thin films at substrate temperatures of the order of 100 °C. Usually in such cases, the target and the substrate [...]


Nano-TiO2 for DSSCs: Optimization, Production, and Market

posted by Marie-Isabelle Baraton

“The production of titanium dioxide (TiO2) represents a very large market and should top $2.3 billion by 2012. Nearly 95% of the TiO2 production is supplied into the pigment industry for a volume of 4.5 million tons. Indeed, TiO2 is the most widely used white pigment mainly in the paint, [...]


Plasma Processing for Photovoltaics: Fundamentals and Applications

posted by Richard van de Sanden

Paper presented at ICMCTF 2011. “In this presentation I will address the different roles atomic hydrogen and ions play in the synthesis of thin amorphous and crystalline materials. In particular I will address the role of atomic H during the growth of amorphous and microcrystalline silicon as determined from in [...]


Chemical Vapour Deposition at Atmospheric Pressure

posted by Stefan Kaskel

Presented at MRS Spring Meeting 2011.“A key issue for the production of thin films in photovoltaics, optical coatings, or corrosion protection is cost reduction. In this context, vacuum based processes are often limited especially when large substrates are to be processed. Atmospheric pressure (AP) processes instead allow to process large [...]


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