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AS-Micro: 3-inch RTP system


Three-inch benchtop rapid thermal processorDedicated to research applications Sample size: few square millimeters up to 3-inch Optional 3-inch susceptor for 2-inch sample Quartz tube with stainless steel flanges process chamber Tubular infrared halogen lamps furnace Very fast ramp rates (> 250°C/s) Vacuum capability and optional turbo pump Horizontal motion door [...]


SIMS Workstation , a UHV Surface Analysis System, for thin film depth profiling

Hiden Analytical 

A rugged general purpose SIMS and SNMS analysis station:- Rapid turnaround of all types of samples- Static and dynamic SIMS- Integral ioniser for SNMS and RGA- Choice of Ion guns- SNMS surface mapping / imaging- Surface contamination analysis- Quantification of matrix level by SNMS- Flexible and upgradeable configuration- Low cost [...]


EQS, a Secondary Ion Mass Spectrometer bolt on SIMS Analyser

Hiden Analytical 

State of the art, bolt-on SIMS probe for integration into your existing UHV surface science chamber. Applications Include: – Static / Dynamic SIMS with energy analysis- Integral front end ioniser for RGA- Composition / contamination analysis- Depth profiling- Leak detection and desorbed gas analysis- Compatible with Hiden SIMS Workstation- Suitable [...]


Hiden Ion Milling Probe – End Point Detector

Hiden Analytical 

The only dedicated end point determination tool for ion etch control and optimum process quality. Applications Include: – End point Analysis- Target Impurity Determination- Quality Control / SPC- Residual Gas Analysis- Leak DetectionThe IMP is a differentially pumped, ruggedized secondary ion mass spectrometer for the analysis of secondary ions and [...]


EQP – Mass and Energy Analyser for Plasma Diagnostics

Hiden Analytical 

Complete energy resolved mass speciation and mass resolved energy analysis of all species in your plasma:- Positive ions, Negative Ions, Neutral Radicals and Neutrals analysis.- Etching / Deposition Studies- Ion implantation / Laser Ablation- Residual Gas Analysis / Leak Detection- Plasma electrode coupling – follow electrode conditions during operation.- Analysis [...]


ESPion, an Advanced Langmuir Probe for Plasma Diagnostics

Hiden Analytical 

The most advanced and reliable Langmuir Probe available for:- Etching / Deposition / Cleaning Plasma Processes- Pulsed plasma operation.- Ion collection (Ni & Gi)- Electron retardation (Te & EEDF)- Electron collection (Ne).- Plasma Potential.- Debye Length, floating potential- Ion fluxThe ESPion advanced Langmuir probe for rapid, reliable and accurate plasma [...]


Residual Gas Analysers for Vacuum Diagnostics and Leak Detection – RGA Series Quadrupole Mass Spectrometers

Hiden Analytical 

Hiden RGA series quadrupole mass spectrometers for the examination of components present in a vessel or evolved from a process, featuring: – PPM Sensitivity, mass range to 300 amu, Remote (PC) or Local Control interface.- Stability (less than ±0.5% height variation over 24 h).- MASsoft control via RS232, USB or [...]


The Hiden HPR-30 Process Gas Analyser – for Vacuum Coating/Plasma Etching

Hiden Analytical 

For the examination of all the components present in your chamber or evolved from your system:- CVD / PECVD / RIE / LPCVD / MOCVD- Vacuum Coating / Plasma Etching- Sputter Deposition- Contamination Studies- Base Pressure Fingerprint- Leak Detection / Virtual Leaks / desorption- Outgassing / Bakeout / Pump Performance- [...]


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