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KJLesker: Rectangular Gate Valve

Kurt J. Lesker Company 

KJLC® has recently introduced a new line of rectangular gates valves to help meet the demand for the wider rectangular valve openings commonly used for semiconductor processing, solar panels, LCD/flat panel, and other vacuum coating applications. Our new valves are rated up to 2 million cycles and available with [...]

 

PET base foil from Agfa

Agfa-Gevaert N.V. 

Ranging in thickness from 63 to 275 microns, basically two PET film bases are produced: a clear transparent and a white opaque (Synaps).Coating techniques can add adhesive image layers, anti-static layers, transparent conductive layers, barrier layers with off-line possibilities to structure layers with various patterns. These layers can be applied [...]

 

Boron Nitride Ceramic Evaporation Boats for Metallization

Shandong Pengcheng Special Ceramics Co., Ltd 

ceramic evaporation boat for metallizingResistivity(normal temperature): 300-2000μΩ.cmevaporation rate(1450°C): 0.4-0.5g/min.cm2working temperature: 100/40W/mkcoefficient of thermal expansion(1450°C) : (4-6)x10-6khot bending intensity(normal temperature): >150mpaproduct dimension : Besides standard size, can according to the customer demand for machiningpacking: vacuumizeA new generation of Conductive Ceramic Composite Evaporation [...]

 

Boron Nitride Insulating Ceramics Products

Shandong Pengcheng Special Ceramics Co., Ltd 

Kinds Of Boron Nitride Products(BN)Boron Nitride main technical parameters Melting point/°C 3000(disintegrate)Operating temperature/°C 900~1000(atmosphere),2800(N2)Density/g.cm-3 2.27Hardness(Moh’s) 2Thermal conductivity/W.m-3.K-1 46.75~50.24Coefficient of thermal expansion/10-6 °C-1 7.5Breakdown voltage/kV.m-1 (3.0~4.0)×104Dielectric constant(ε) 4.0~4.3Dielectric loss(tanδ)/10-4 2~8Resistivity /Ω.m >1012Bending strength(RT) >35mpaThe compressive strength(RT) >200mpaThe hexagonal BN ceramic density is small (2.27 g/cm3) hardness is low, can undertake [...]

 

RC™ Quartz Crystals for Precision Deposition QCMs

X-TRONIX LTD 

The measurement of film thickness during a vacuum deposition process can be accomplished with great accuracy and precision using a quartz crystal microbalance, or QCM. Under controlled conditions, it is possible to achieve Ångstrom level resolution of the film thickness. In practice, however, this is rarely achieved.A film thickness monitor [...]

 

Micropole (TM) quadrupole Residual Gas Analyser (RGA)

X-TRONIX LTD 

The Micropole™ Residual Gas Analyzer is one of the smallest complete mass spectrometer systems available, with the world’s most miniaturized ever sensor head. The compact size is achieved by the patented design of miniature array of quadrupole mass filters. The array offers similar or greater sensitivity than conventional mass spectrometers [...]

 

Temperature Measuring Film Thickness Monitor

X-TRONIX LTD 

Eon™ Feedthrough Mounted Film Thickness Monitor. A new era in thin film deposition instrumentation has arrived!The world is changing to networks running everything, and your film thickness monitor is no different. To meet this demand, others have developed simple units in place of the oscillator that connect to the feed [...]

 

HVA 81000 Series Aluminum Gate Valves

HVA, LLC 

The 81000 Series Aluminum Gate Valves are designed for high vacuum applications specifically when pressure ranges approximate 1 x 10-7 mbar and bakeout temperatures do not exceed 150°C. These valves are designed for system integrators, designers and OEM’s within the Semiconductor, Solar, LED/FPD, Coating and BioPharm industries due to their [...]

 

HVA 71000 Series Harsh Process Valve

HVA, LLC 

The 71000 Series HPV (Harsh Process Valves) are designed for the harshest of vacuum environments. In typical harsh applications like MOCVC, ALD, PECVD the valves are subject to aggressive chemicals and high temperatures. The byproducts can affect the operation of the wheels/bearings, linkages and can cause the valve to seize [...]

 

HT1414 Experimental Scale multi-purpose CVD System

Archer Technicoat Ltd 

The HT1414 is a CVD reactor suitable for SiC, TiC, B4C, Si3N4, TiN, BN, and related materials. It is a top-loading reactor with a working zone 350 mm diameter by 350mm high. The all carbon, working zone is suitable for operation up to 2,200ºC at pressures between 1 and 1000mbar. [...]

 
 

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