TECHNICAL AND DECORATIVE PVD – PECVD SYSTEMSThanks to advanced flexibility different technologies – CAE, MagnetronSputtering, PECVD – can be installed before purchase and in the future,according different customer needs.- Flexible- Loading door on the top- Many configurations- Interface with other systems- Ø 850 x 550 mm – Chamber size- 400 [...]

YTI manufactures state-of-the-art vacuum deposition systems. More than thirty years of hands on experience and extensive knowledge in vacuum technology allows our engineers to analyze your process and offer sound, equitable solutions for your requirements. We work closely with our customes to ensure design integrity as the system [...]

TECHNICAL AND DECORATIVE PVD – PECVD SYSTEMSThanks to advanced flexibility different technologies – CAE, MagnetronSputtering, PECVD – can be installed before purchase and in the future,according different customer needs.- FlexibleInnovative- Ø 1330 x 1600 mm Chamber size- 1100 mm usable plasma volume- fast process- High performance control system- PVD and [...]

Fully Equipped Concept PVD PECVD PLUS seriesA new season for the Vacuum Coating Machines is beginning. The company located in Milan is offering fully equipped coaters with plasma, PECVD, thermal co-evaporators, sputtering: in one single station. Kolzer’s revolutionary vacuum deposition systems deposit uniform thin-film coatings onto any kind of substrates, [...]

ZZS-Series are box-type semiautomatic vacuum coating systems. They features powerful vacuum pumping system, super-vacumm coating quality, easy operation and low cost to fit your budget.Specifications:*Resistance Evaporation electrodes: 2 pairs*Electron Beam Gun: 1pcs 5-8KW (optional)*Ultimate Vacuum: 3×10-4 Pa*Substrate Rotation Speed: 0~30rpm*Bake Temperature: Room temperature~350 °C*Thickness Control (optional)*Operation Mode: Manual/semi-automatic switchableTypical [...]

Our Pulsed Laser Deposition Systems combine state-of-the-art functions and features in a compact, versatile platform that would form the centre-piece of any R&D facility.Base Model:– PLD chamber for 1 inch samples- 5-Axis UHV Sample Holder with substrate rotation, heating, cooling, and integrated quartz balance- 6 target stepper motor controlled [...]

Our PVD systems are the very latest concept in cost effective R&D. The TRI-DEP is a multi-technique sputtering/thermal/e-beam evaporation system. The CLAM II is our feature rich sputtering system.TRI-DEP:-A multi-source PVD system which can be configured with varous sources or mixtures of sources for: * Magnetron Sputter [...]

Our custom, multi-technique UHV systems combine a wide range of thin film deposition/growth and UHV surface analysis techniques into a single, versatile system that doesn’t cost the earth.Available as both bespoke turnkey systems and as modular add-on’s to extend the capabilities of existing equipment, they are the centre piece of [...]

We manufactured our first thin-film vacuum deposition system over 20 years ago at our U.S. headquarters in Pittsburgh, PA. Hundreds of systems later our proven Process Equipment Division, with engineering, manufacturing, and clean-room assembly areas in the U.S. and U.K., design and manufacture PVD and CVD deposition systems to suit [...]

The HT1414 is a CVD reactor suitable for SiC, TiC, B4C, Si3N4, TiN, BN, and related materials. It is a top-loading reactor with a working zone 350 mm diameter by 350mm high. The all carbon, working zone is suitable for operation up to 2,200ºC at pressures between 1 and 1000mbar. [...]