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Systems

 

200 mm DLI-MOCVD / DLI-ALD machine

ANNEALSYS 

The Annealsys MC200 system is a CVD reactor especially developed to meet the requirements of research and development units. It is designed for MOCVD and ALD processes for deposition of metal and metal alloys, oxides and transition metal nitrides.It allows doing heteroepitaxy of oxides on single crystals wafers (such as [...]

 

Vacuum Deposition Systems

Yeagle Technology Inc 

YTI manufactures state-of-the-art vacuum deposition systems. More than thirty years of hands on experience and extensive knowledge in vacuum technology allows our engineers to analyze your process and offer sound, equitable solutions for your requirements. We work closely with our customes to ensure design integrity as the system [...]

 

Kurt J Lesker: Vacuum Systems

Kurt J. Lesker Company 

KJLC remains a leader in the manufacture of fully integrated vacuum systems. We offer single chamber deposition systems or cluster tools with robotic transfer for production and research applications. Extensive knowledge of process, application, mechanical, electrical, and software engineering help KJLC to be your primary supplier of vacuum deposition equipment. [...]

 

MC050: 2-inch mutli process reactor MOCVD, ALD, RTP & RTCVD

ANNEALSYS 

The Annealsys MC050 is a 2-inch CVD reactor with multi process capabilities including DLI-MOCVD, DLI-ALD, RTP and RTCVD. It has been especially developed to meet the requirements of research and development units and allows running several processes in sequence inside the same process chmaber.The DLI (direct liquid injection) vaporizer offers [...]

 

AS-Master 200 mm RTP system up to 1500°C

ANNEALSYS 

The AS-Master rapid thermal processor is a highly versatile tool allowing a wide range of processes from annealing to rapid thermal chemical vapor deposition. The high temperature version can run annealing processes up to 1500°C. Optional square chamber is available for square samples processing.The cold wall chamber technology provides high [...]

 

Spray CVD system: 2-inch aerosol CVD system

ANNEALSYS 

The Annealsys Spray-CVD-050 is a 2-inch Spray CVD (aerosol CVD) reactor especially developed to meet the requirements of research and development units. The infrared lamp heating system provides in-situ rapid thermal annealing process capability inside the deposition chamber. The system can be equipped with Kemstream Atokit for the precursor atomization [...]

 

AS-One: 4-inch and 6-inch RTP systems

ANNEALSYS 

4-inch (100 mm) and 6-inch (150 mm) wafer capability Floor standing system for reduced footprint From room temperature up to 1500°C High reliability and low cost of ownership Stainless steel cold wall chamber technology: High process reproducibility Ultra clean and contamination-free environment High cooling rates and low memory effect Pyrometer [...]

 
 

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