Latest news:
The leading online resource for Vacuum Coating, Plasma Processing, Thin Film Fabrication, and Nanotechnology



ELOGE 3D poster to be presented at IMLB 2010 (CVD of electrolyte)

ANNEALSYS    |  25 Jun 2010

A poster on the results of the work performed in the frame of the ANR project ELOGE 3D (Chemical …


Annealsys announces Fast cooling solutions for RTP systems

ANNEALSYS    |  24 May 2010

Annealsys is proud to announce fast cooling solutions for Rapid Thermal Processing systems. These …


Annealsys announces the AS-Micro Twin Chamber system

ANNEALSYS    |  31 Jul 2009

The AS-Micro Twin allows management of cross-contaminations control . Incompatible materials can be …


Annealsys presents its new catalog of CVD, MOCVD and Spray CVD systems

ANNEALSYS    |  31 Jul 2009

These reactors were specially developed for R&D applications. They allow doing heteroepitaxy of …


Annealsys represents Cambridge NanoTech in France .

ANNEALSYS    |  28 Feb 2009

Cambridge NanoTech ALD systems: – Savannah ALD systems – Phoenix Production ALD system – Fiji …


Annealsys partner of Crisilal, ANR funded program, for crystallization of silicon thin films on metal substrates for photovoltaic applications

ANNEALSYS    |  29 Feb 2008

Annealsys is partner of Crisilal R&D project with CEA LITEN-INES-RDI, Université Louis Pasteur …


Annealsys introduces MC050 Spray CVD and MOCVD R&D tool with in-situ annealing capability

ANNEALSYS    |  30 Nov 2007

Annealsys introduces MC050 2-inch MOCVD and Spray CVD reactor especially developed to meet the …


Log In

Remember Me
Or log-in using Your account on